Method used for obtaining highly pure silicon used as a semiconductor material is

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General Principles and processes of Isolation of Elements

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Method used for obtaining highly pure silicon used as a semiconductor material is

A

Oxidation

B

Electrochemical

C

Crystallization

D

Zone refining

(AIPMT-1994)

Solution

(d)By the process of zone refining pure silicon is obtained which is used in semiconductor.

Standard 12

Chemistry

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